HIGH-PURITY VITREOUS SILICA CRUCIBLE USED FOR PULLING LARGE-DIAMETER SINGLE-CRYSTAL SILICON INGOT WHICH ENABLES REDUCTION OF PINHOLE DEFECT AMONG LARGE-DIAMETER SINGLE-CRYSTAL SILICON INGOT

摘要

the diameter ( ) for high purity silicon single crystal ingot impression quartz glass crucible , the bubble content: 1% or more and less than 10% , purity : 99.99 % or greater purity and an outer layer of amorphous silica glass , the bubble content of not more than 0.6% , purity: large-diameter silicon single crystal ingot having a layered structure of two or more of the 99% of the inner layer of high-purity amorphous silica glass as a high-purity quartz glass crucible for impression , longitudinal section the inner surface of the quartz glass crucible between the inner surface of at least the start line and ingot impression impression end line of the silicon melt surface is in a shape the waveform ( ), depth : 0.5mm~2mm, width : 10mm~100mm of the multi-stage consisting of a ring groove ( ) ring (ring) to have a fluted surface . ; quartz crucible and the outer layer , inner layer, a ring groove