PATTERN FORMING METHOD, PATTERN DESIGNING METHOD, AND MASK SET

摘要

pattern design method according to an embodiment of the present invention , a plurality of first mark row - rectangular mark that are disposed at predetermined intervals in the first direction - the direction of the stage in the first to design a pattern formed by the first testing arrangement in a second direction perpendicular to the first direction , and said first mark row a plurality of second mark row disposed between the mark - rectangular marks that are arranged - a step of designing a second pattern formed by arranging for inspection in the second direction - is pre- formed position in the second direction determined by the overlapping length is arranged to overlap the first row that mark - and a ;