首页> 外国专利> HOLLOW STRUCTURE FORMING SUBSTRATE, METHOD OF PRODUCING HOLLOW STRUCTURE FORMING SUBSTRATE, AND METHOD OF PRODUCING HOLLOW STRUCTURE USING HOLLOW STRUCTURE FORMING SUBSTRATE

HOLLOW STRUCTURE FORMING SUBSTRATE, METHOD OF PRODUCING HOLLOW STRUCTURE FORMING SUBSTRATE, AND METHOD OF PRODUCING HOLLOW STRUCTURE USING HOLLOW STRUCTURE FORMING SUBSTRATE

机译:中空构造物,中空构造物的制造方法以及使用中空构造物制造中空构造的方法

摘要

A hollow structure forming a substrate according to the present invention, plastic deformation of the surface (23 ") that are available material plastic deformation film 24 is formed by use of; gas reservoir are arranged in a plurality of regular space 21; the corresponding gas reservoir space, 21 is provided with a first opening (22b) and the second opening (22a) facing the surface (23 ") facing the respective said the gas reservoir to the gas reservoir space (21) under reduced pressure environmental conditions surface (23 ") a plurality of gas outlet 22 to draw toward; and a corresponding first opening (22b) and the corresponding second opening (22a), each provided, wherein the surface of plastic-deformable material in the space between the (23 ") from a plurality of intrusion prevention space (22c) for preventing the gas from entering into the reservoir space (21).
机译:形成根据本发明的基板的中空结构,利用以下材料形成可利用的材料塑性变形膜24的表面(23″)的塑性变形;在多个规则空间21中布置储气罐;对应的气体储气空间21在减压环境条件下的表面(23)上具有面向与所述储气室相对的面向所述储气空间(21)的表面(23″)的第一开口(22b)和第二开口(22a)。 ”)向其引出的多个气体出口22;以及分别设置的相应的第一开口(22b)和相应的第二开口(22a),其中,可塑性变形材料的表面位于(23”)之间的空间多个防侵入空间(22c),用于防止气体进入储存空间(21)。

著录项

  • 公开/公告号KR101118446B1

    专利类型

  • 公开/公告日2012-03-06

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20097016493

  • 申请日2008-01-10

  • 分类号B29C33/38;B29C44/00;G03F7/20;

  • 国家 KR

  • 入库时间 2022-08-21 17:08:32

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