MICROWAVE PLASMA PROCESSING APPARATUS, DIELECTRIC WINDOW FOR USE IN THE MICROWAVE PLASMA PROCESSING APPARATUS, AND METHOD FOR MANUFACTURING THE DIELECTRIC WINDOW

摘要

( challenges ) as a gas for generating plasma, even when using Kr, Ar , etc. , other Hee ( ) When using a gas with an oxide film of the same characteristics , it was found that the microwave plasma processing apparatus that can not only obtain the nitride film is present . ; ( solving means ), the microwave plasma processing apparatus constituting the dielectric window (dielectric window ) , not only the members constituting the ceramic member , the surface ( ) of the processing space side of that ceramic members , by a heat treatment with a stoichiometric SiO ₂ is applied to obtain the composition of the coating film is planarized and then , very smooth by heat-treating , and to form a planarizing coating insulating film having a dense surface . To form a corrosion-resistant coating is disposed on the insulating planarization art .