首页> 外国专利> TUNGSTEN COATING LINER WHICH COMPOSES AN ARC CHAMBER INNER WALL OF ION IMPLANTATION EQUIPMENT, AND AN ARC CHAMBER OF THE ION IMPLANTATION EQUIPMENT USING THE SAME

TUNGSTEN COATING LINER WHICH COMPOSES AN ARC CHAMBER INNER WALL OF ION IMPLANTATION EQUIPMENT, AND AN ARC CHAMBER OF THE ION IMPLANTATION EQUIPMENT USING THE SAME

机译:组成离子注入设备的电弧室内壁的钨涂层衬管和使用相同的离子注入设备的电弧室

摘要

PURPOSE: A tungsten coating liner and an arc chamber of ion implantation equipment using the same are provided to reduce edge cracks by increasing an edge coupling area of a tungsten coating layer through an edge rounding processing.;CONSTITUTION: Tungsten coating liners(500) composes an arc chamber inner wall of ion implantation equipment. The tungsten coating liners respectively comprise a square graphite plate(502) and a tungsten coating layer. An ion gas injection unit is formed in the center of the tungsten coating liner. The square graphite plate is rounded according to the upper edge. The tungsten coating layer is coated in the upper side of the graphite plate as constant thickness. The graphite plate comprises a recess(502a) in the upper side. The tungsten coating liner is inserted into the recess.;COPYRIGHT KIPO 2012
机译:目的:提供钨涂层衬垫和使用该涂层的离子注入设备的电弧室,以通过边缘修圆处理增加钨涂层的边缘耦合面积,从而减少边缘裂纹。组成:钨涂层衬垫(500)组成离子注入设备的电弧室内壁。钨涂层衬里分别包括方形石墨板(502)和钨涂层。在钨涂层衬里的中心形成离子气体注入单元。方形石墨板根据上边缘倒圆。钨涂层以恒定的厚度被涂覆在石墨板的上侧中。石墨板在上侧包括凹槽(502a)。将钨涂层衬里插入凹槽中。; COPYRIGHT KIPO 2012

著录项

  • 公开/公告号KR101132720B1

    专利类型

  • 公开/公告日2012-04-19

    原文格式PDF

  • 申请/专利权人 SUNG SIM;CHOI YOUNG MI;

    申请/专利号KR20100135531

  • 发明设计人 CHOI YOUNG MI;

    申请日2010-12-27

  • 分类号H01J37/317;

  • 国家 KR

  • 入库时间 2022-08-21 17:08:19

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