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X-ray targets and its fabrication method for generation of coherent x-rays

机译:X射线靶及其产生相干X射线的方法

摘要

PURPOSE: An x-ray target and a method for manufacturing the same are provided to generate coherent x-ray beams by forming an integrated type x-ray single mode source through a nano-channel formatting method. CONSTITUTION: A substrate is washed with acetone and distilled water. The substrate is mounted to a sputtering device. The sputtering device is formed into an ultra-high vacuum state. Argon gas is introduced into a vacuum chamber. A tungsten thin film is deposited to form a buffer layer. The thickness of the tungsten thin film is 200nm. An optical mask is arranged on the core(50) of a waveguide Beryllium is deposited to the core. The optical mask is eliminated.
机译:目的:提供一种X射线靶及其制造方法,以通过纳米通道格式化方法形成集成型X射线单模源,以产生相干的X射线束。组成:基材用丙酮和蒸馏水洗涤。基板被安装到溅射装置。溅射装置形成为超高真空状态。将氩气引入真空室。沉积钨薄膜以形成缓冲层。钨薄膜的厚度为200nm。将光掩模布置在波导的芯(50)上,将铍沉积到芯上。取消了光学掩模。

著录项

  • 公开/公告号KR101161230B1

    专利类型

  • 公开/公告日2012-07-09

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20090018933

  • 发明设计人 최재호;

    申请日2009-03-05

  • 分类号H05G1;H01J35;

  • 国家 KR

  • 入库时间 2022-08-21 17:07:51

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