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Thyristors self-defense against BREAKDOWN

机译:晶闸管自防御击穿

摘要

The invention relates to power semiconductor devices, namely to the design of semiconductor devices based on semiconductor structures with alternating layers of p- and n-type conductivity (thyristors photothyristors, opto-thyristors dinistorov, triacs, etc.) having a self-protection against breakdown when switching due to overexertion.; The technical result of the proposed solutions is to provide a self-protected thyristor (self-protection) against overvoltage in a large range of voltage rise speeds - from quasistatic mode to ultra-high speeds of the order of 10 kV / ms and, consequently, improving the reliability of the thyristor.; Summary of the utility model: The semiconductor structure thyristor comprising a main thyristor structure and within the centrally symmetric auxiliary thyristor structure in an amount of not less than two, having a local region with low resistivity in the semiconductor structure the center in the n-base near the collector pn-junction, in vicinity of the center of the second or a subsequent auxiliary thyristor structures in p-base near the collecting pn-transition is formed by one or several local raids stey with low resistivity, the resistivity in the area (s) is greater than the local region in the center, and less than the main thyristor structure, and this area (s) extends beyond the local area of ​​the region in the center of the semiconductor structure, as a result which avalanche breakdown voltage of pn transition near the center of the auxiliary thyristor structure with said region of greater resistance and differential channel (channel) values ​​less avalanche similar parame pit in the center of the semiconductor structure.
机译:本发明涉及功率半导体器件,即涉及基于具有p型和n型导电性交替层的半导体结构(晶闸管光晶闸管,光晶闸管dinistorov,三端双向可控硅等)的半导体器件的设计。切换时由于过度劳累而击穿。提出的解决方案的技术成果是提供一种自保护晶闸管(自我保护),以在较大的电压上升速度范围内(从准静态模式到大约10 kV / ms的超高速)提供过压保护。 ,提高了晶闸管的可靠性。本实用新型的概述:一种半导体结构晶闸管,其包括主晶闸管结构和在中心对称辅助晶闸管结构内的不少于两个的量,在半导体结构中具有低电阻率的局部区域,其中心在n基极中在集电极pn结附近,在靠近收集pn过渡的p基中的第二个或后续辅助晶闸管结构的中心附近,是由一个或多个电阻率低的局部raid stey形成的,该区域的电阻率( s)大于中心的局部区域,并且小于主晶闸管结构,并且该区域(s)延伸到半导体结构中心的区域的局部区域之外,结果雪崩击穿辅助晶闸管结构中心附近的pn过渡电压,其中所述区域具有更大的电阻和差分通道(channel)值较小,雪崩相似参数pi t在半导体结构的中心。

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