Apparatus and method for the plasma-enhanced modification of the surface of substrates in a vacuum

摘要

Apparatus for plasma-enhanced modification of the surface of substrates in a vacuum, with a first and a second electrode (1, 2), of which at least one electrode to a high frequency voltage generator (5) is connected and the electrodes (1, 2) in at least one of the axial direction of the same, a length greater than or equal to λ / 4 of the electrical voltage, and wherein at the first electrode (1) at least three supply contacts (3a, 3b and 4) for electrical voltage are present, two supply contacts (3a, 3b) in the axial direction with the greatest length in each case on an outer edge or edge region and at least one inner supply contact (4) between the two supply contacts (3a and 3b) in each case on one of the second electrode (2) is arranged on the side facing away from; characterised in that electrical voltage of the at least one high frequency voltage generator (5) either at the two outer supply contacts (3a and 3b) or on the at least one inner supply contact (4) can be supplied alternately.