首页> 外国专利> Applying a protective layer on a substrate, comprises introducing plate shaped substrates into a vacuum system, treating the substrate in the vacuum system, and applying a ribbon-shaped protective film on the substrate

Applying a protective layer on a substrate, comprises introducing plate shaped substrates into a vacuum system, treating the substrate in the vacuum system, and applying a ribbon-shaped protective film on the substrate

机译:在基板上施加保护层包括:将板状基板引入真空系统;在真空系统中处理基板;以及在基板上施加带状保护膜

摘要

The method comprises introducing plate shaped substrates (1) into a vacuum system, treating the substrate in the vacuum system, applying a ribbon-shaped protective film on the substrate, and discharging the treated substrate from the vacuum system. The method is carried out under the action of mechanical pressure and/or temperature. The protective film is treated in the vacuum system before or after its application on the substrate and supplied to the substrate from a band-shaped dispenser roll arranged in the vacuum system. The method comprises introducing plate shaped substrates (1) into a vacuum system, treating the substrate in the vacuum system, applying a ribbon-shaped protective film on the substrate, and discharging the treated substrate from the vacuum system. The method is carried out under the action of mechanical pressure and/or temperature. The protective film is treated in the vacuum system before or after its application on the substrate and supplied to the substrate from a band-shaped dispenser roll arranged in the vacuum system. The separation of the substrates takes place only when a further substrate is partially occupied in the vacuum system. The detachment of the protective film, directly before or during the manufacturing step, takes place after discharging the substrate. An independent claim is included for an apparatus for applying a protective layer on a substrate.
机译:该方法包括:将板状基板(1)引入真空系统;在真空系统中处理基板;在基板上施加带状保护膜;以及将处理过的基板从真空系统中排出。该方法在机械压力和/或温度的作用下进行。在将保护膜施加到基底上之前或之后,在真空系统中对保护膜进行处理,并从布置在真空系统中的带状分配器辊将保护膜供应至基底。该方法包括:将板状基板(1)引入真空系统;在真空系统中处理基板;在基板上施加带状保护膜;以及将处理过的基板从真空系统中排出。该方法在机械压力和/或温度的作用下进行。在将保护膜施加到基底上之前或之后,在真空系统中对保护膜进行处理,并从布置在真空系统中的带状分配器辊将保护膜供应至基底。仅当在真空系统中部分占用了其他基材时才发生基材分离。保护膜的剥离,恰好在制造步骤之前或过程中,是在排出基板之后发生的。对于在基板上施加保护层的设备包括独立权利要求。

著录项

  • 公开/公告号DE102010061732A1

    专利类型

  • 公开/公告日2012-05-24

    原文格式PDF

  • 申请/专利权人 VON ARDENNE ANLAGENTECHNIK GMBH;

    申请/专利号DE20101061732

  • 发明设计人 HEINRICH HANS-JUERGEN;

    申请日2010-11-22

  • 分类号C23C14/56;

  • 国家 DE

  • 入库时间 2022-08-21 17:05:11

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