Method for observing status of plasma chamber to control process of coating e.g. glass substrate, during semiconductor manufacturing process, involves supplying measurement signal into plasma chamber with measurement signal frequency

摘要

The method involves arranging a workpiece (12) in a plasma chamber (11). An excitation signal with excitation fundamental frequency is supplied into the plasma chamber by the workpiece for stimulating and/or maintaining a plasma (13) in the plasma chamber. A detection signal of the plasma chamber is received and analyzed. A measurement signal is supplied into the plasma chamber with measurement signal frequency in a continuous or pulsed manner, where the measurement signal frequency deviates from the excitation fundamental frequencies. An independent claim is also included for a device for observing a status of a plasma chamber.