A vapor deposition method for continuously depositing and treating a thin film layer on a substrate

摘要

What is provided is an integrated device (10) for vapor deposition of a sublimated starting material as a thin layer on a photovoltaic module substrate (14) and for subsequent vapor treatment. The apparatus (10) may include: a load vacuum chamber (28); a first vapor deposition chamber (19); and a second vapor deposition chamber (21) integrally connected so that substrates (14) carried by the device (10) are maintained at a system pressure that is less than (760) Torr. A conveyor system may be operably disposed in the apparatus (10) and configured to position substrates (14) in a serialized, controlled speed into and through the load vacuum chamber (28), into and through the first vapor deposition chamber (19) and in FIG and through the second vapor deposition chamber (21). Further, methods of making a thin film cadmium telluride based thin film photovoltaic device (14) are provided.