A vapor deposition apparatus and method for continuously depositing a doped thin film layer on a substrate

摘要

An apparatus and associated method for vapor deposition of a sublimed source material as a thin film on a photovoltaic (PV) module substrate is provided. A vessel is disposed within a vacuum head chamber and is adapted to receive a source material which is supplied from a first supply tube. A second feed tube can deliver a dopant material into the deposition head. A heated manifold is located below the vessel and contains a plurality of channels defined through it. The vessel is indirectly heated by the manifold to an extent sufficient to sublimate the source material within the vessel. A distribution plate is arranged below the manifold and at a defined distance above a horizontal plane of a substrate conveyed through the device, in order to further distribute the sublimed source material which flows through the manifold onto the surface of the substrate below.