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A vapor deposition apparatus and method for continuously depositing a thin film layer on a substrate

机译:在衬底上连续沉积薄膜层的气相沉积设备和方法

摘要

Apparatus (100) and a process for vapor deposition of a sublimated source material as a thin film are provided on a photovoltaic (PV) module substrate (14). The device (100) contains at least one receptacle (116) arranged in a deposition head (110). Each receptacle (116) is adapted to receive granular source material (117). A heating system is arranged to heat the receptacle (s) (116) for sublimating the source material (117). A substantially vertical distribution plate (152) is disposed between the receptacle (s) (116) and a substrate (14) transported by the device (100). The distribution plate (152) is positioned at a defined distance from a vertical transport plane of a deposition surface of the substrate (14). The distribution plate (152) has a pattern of passages therethrough that distributes the sublimated source material for deposition on the deposition surface of the substrate (14).
机译:在光伏(PV)模块基板(14)上提供用于将升华的源材料薄膜沉积的设备(100)和方法。装置(100)包含布置在沉积头(110)中的至少一个容器(116)。每个容器(116)适于接收颗粒状的原料(117)。布置加热系统以加热容器(116)以升华原料(117)。基本上竖直的分配板(152)设置在容器(116)和由装置(100)运输的基板(14)之间。分配板(152)被定位成与基板(14)的沉积表面的垂直输送平面相距限定的距离。分配板(152)具有穿过其中的通道的图案,该图案分配升华的源材料以在基板(14)的沉积表面上沉积。

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