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Process for chemically modify a matrix with its depth.

机译:化学修饰基质深度的过程。

摘要

The present invention relates to a process for chemically modifying, within its thickness, a polymer matrix chosen from matrices made of fluoropolymers and matrices made of aliphatic polymers, said process comprising at least one step consisting in irradiating said matrix with UV light having a wavelength of less than 300 nm in order to generate, within the thickness of said matrix, zones that have short polymer chains, formed by scission of the existing chains during the passage of the UV radiation and that have free radicals denoted hereinbelow as “activated zones”. The present invention also relates to the polymer matrix capable of being chemically modified by such a process.
机译:本发明涉及一种在厚度范围内化学改性选自含氟聚合物基体和脂族聚合物基体的聚合物基体的方法,所述方法包括至少一个步骤,所述方法是用波长为0-5nm的UV光照射所述基体。为了在所述基质的厚度内产生小于300nm的区域,所述区域具有短的聚合物链,所述短的聚合物链是通过在紫外线辐射通过期间现有链的断裂而形成的,并且具有以下称为“活化区”的自由基。 。本发明还涉及能够通过这种方法进行化学改性的聚合物基质。

著录项

  • 公开/公告号FR2945045B1

    专利类型

  • 公开/公告日2012-08-31

    原文格式PDF

  • 申请/专利权人 COMMISSARIAT A LENERGIE ATOMIQUE;

    申请/专利号FR20090055859

  • 发明设计人 THOMAS BERTHELOT;CECILE BAUDIN;

    申请日2009-08-27

  • 分类号C08J3/28;C08L23/02;C08L27/12;C08L51/06;

  • 国家 FR

  • 入库时间 2022-08-21 17:04:20

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