VACUUM FILM DEPOSITION APPARATUS AND METHOD FOR CLEANING THE VACUUM FILM DEPOSITION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a vacuum film deposition apparatus where an interior can be readily cleaned at low cost, and to provide a method for cleaning the vacuum film deposition apparatus.;SOLUTION: A method for cleaning a vacuum deposition apparatus comprises: disposing a contamination preventive material 30 made of a polymer film so as to cover at least a portion of an interior of a vacuum chamber 11 composing the vacuum deposition apparatus; and, after the deposition by the vacuum deposition apparatus, peeling the contamination preventive material 30 and cleaning the interior of the vacuum chamber 11.;COPYRIGHT: (C)2014,JPO&INPIT