首页> 外国专利> FORMATION METHOD OF BORON-CONTAINING ACID SILICON CARBONITRIDE FILM AND FORMATION METHOD OF ACID SILICON CARBONITRIDE FILM

FORMATION METHOD OF BORON-CONTAINING ACID SILICON CARBONITRIDE FILM AND FORMATION METHOD OF ACID SILICON CARBONITRIDE FILM

机译:含硼酸性硅碳化物膜的形成方法及酸性硅碳化物膜的形成方法

摘要

PROBLEM TO BE SOLVED: To provide a formation method of a boron-containing acid silicon carbonitride film which can shorten the process time, and can contribute to enhancement of throughput.;SOLUTION: In the formation method of a boron-containing acid silicon carbonitride film for forming a boron-containing acid silicon carbonitride film on a base, a boron-containing film is formed on a base (step 1), and then a boron-containing acid silicon carbonitride film is formed by laminating a silicon carbonitride film and an acid silicon nitride film on the boron-containing film (step 2, and step 3).;COPYRIGHT: (C)2014,JPO&INPIT
机译:解决的问题:提供一种含硼的酸性碳氮化硅膜的形成方法,该方法可以缩短处理时间,并且有助于提高生产率。解决方案:在含硼的酸性碳氮化硅膜的形成方法中为了在基底上形成含硼的酸性碳氮化硅膜,在基底上形成含硼的膜(步骤1),然后通过将碳氮化硅膜和酸层压形成含硼的酸性碳氮化硅膜。含硼薄膜上的氮化硅薄膜(步骤2和步骤3).;版权所有:(C)2014,JPO&INPIT

著录项

  • 公开/公告号JP2013206989A

    专利类型

  • 公开/公告日2013-10-07

    原文格式PDF

  • 申请/专利权人 TOKYO ELECTRON LTD;

    申请/专利号JP20120072419

  • 发明设计人 SUZUKI KEISUKE;KADONAGA KENTARO;

    申请日2012-03-27

  • 分类号H01L21/314;H01L21/318;H01L21/316;H01L21/336;H01L29/78;

  • 国家 JP

  • 入库时间 2022-08-21 17:01:52

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