A method for determining the optical properties of materials for optical measurements of structures.

摘要

Methods of determining a material optical property for optical metrology of a structure is described. One method includes simulating a set of diffraction orders for a grating structure based on two or more azimuth angles and on one or more angles of incidence. A simulated spectrum is provided based on the set of diffraction orders. Another method includes simulating a set of diffraction orders for a grating structure based on two or more angles of incidence. A simulated spectrum is provided based on the set of diffraction orders.