首页> 外国专利> TUNNEL MAGNETORESISTANCE EFFECT ELEMENT, AND MAGNETIC MEMORY CELL AND RANDOM ACCESS MEMORY INCLUDING THE SAME

TUNNEL MAGNETORESISTANCE EFFECT ELEMENT, AND MAGNETIC MEMORY CELL AND RANDOM ACCESS MEMORY INCLUDING THE SAME

机译:隧道磁阻效应元件,磁记忆单元和随机访问记忆(包括相同的内容)

摘要

PROBLEM TO BE SOLVED: To provide a high-speed and ultra-low power consumption nonvolatile memory having high thermal stability.;SOLUTION: In a nonvolatile magnetic memory, a high-output tunnel magnetoresistance effect element in which a free layer having high thermal stability is applied is provided, and a writing method by a spin-transfer torque is applied. The tunnel magnetoresistance effect element 1 includes a free layer comprising a first ferromagnetic film 306 and a second ferromagnetic film 308, which have a body-centered cubic structure containing Co, Fe and B, and a first nonmagnetic film 307, and has a structure in which a fixed layer 3021 is stacked via an MgO insulating film 305 having a rock-salt structure (100)-oriented to the free layer.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:提供具有高热稳定性的高速且超低功耗的非易失性存储器;解决方案:在非易失性磁存储器中,一种高输出隧道磁阻效应元件,其中自由层具有高热稳定性提供一种应用,并且应用一种通过自旋转移转矩的写入方法。隧道磁阻效应元件1包括具有第一铁磁膜306和第二铁磁膜308的自由层,该第一铁磁膜306和第二铁磁膜308具有包含Co,Fe和B的体心立方结构,以及第一非磁膜307,并且具有固定层3021经由MgO绝缘膜305堆叠而成,该绝缘膜305具有面向自由层的岩盐结构(100).;版权所有:(C)2013,JPO&INPIT

著录项

  • 公开/公告号JP2013016820A

    专利类型

  • 公开/公告日2013-01-24

    原文格式PDF

  • 申请/专利权人 HITACHI LTD;TOHOKU UNIV;

    申请/专利号JP20120181778

  • 申请日2012-08-20

  • 分类号H01L21/8246;H01L27/105;H01L43/08;H01L43/10;H01L29/82;H01F10/32;

  • 国家 JP

  • 入库时间 2022-08-21 17:00:50

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