ULTRASONIC DEVELOPMENT PROCESSING METHOD AND ULTRASONIC DEVELOPMENT PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an ultrasonic development processing method and an ultrasonic development processing device which allow for development with low impact while shortening the development time, and enhancing the development accuracy and the elimination effect of residual scum in the circuit pattern part.;SOLUTION: The ultrasonic development processing device performing development processing by bringing a developing solution into contact with the circuit pattern P surface of a substrate G subjected to exposure processing, e.g. by applying the developing solution thereto, comprises an ultrasonic vibrator 7B having an oscillation surface 7b which abuts against the substrate side surface near the circuit pattern of the substrate in contact with the developing solution, and a high frequency drive power supply 31 of the ultrasonic vibrator. In a state where the oscillation surface of the ultrasonic vibrator is abutting against the substrate side surface near the circuit pattern of the substrate after applying the developing solution to the substrate surface, development processing is performed by making an ultrasonic vibration generated from the ultrasonic vibrator propagate through the developing solution on the circuit pattern.;COPYRIGHT: (C)2013,JPO&INPIT