首页> 外国专利> Accumulation manner of the polycrystal silicone films which have random grain structure, manner and the manner null which forms the tungsten/silicon which make the polycrystal silicon gate electrodes accumulate which have the random grain structure which is doped composite membrane

Accumulation manner of the polycrystal silicone films which have random grain structure, manner and the manner null which forms the tungsten/silicon which make the polycrystal silicon gate electrodes accumulate which have the random grain structure which is doped composite membrane

机译:具有随机晶粒结构的多晶硅膜的积累方式,形成钨/硅的方式和形成钨/硅的方式无效,该多晶硅栅电极具有掺杂有复合材料膜的无规晶粒结构。

摘要

Method and the device in order to form the polycrystal silicon membranes. According to this invention, the process gas blend which includes with the silicon source gas and H the dilution gas blend which includes2 and the inert gas is supplied to the chamber. The polycrystal silicon membranes are formed from that process gas blend. Selective figure 1
机译:方法和装置以形成多晶硅膜。根据本发明,将包含硅源气体和H的稀释气体混合物与惰性气体混合的工艺气体混合物被供给至腔室,所述稀释气体混合物包括 2 和惰性气体。多晶硅膜是由该工艺气体混合物形成的。<选择图> 1

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