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Reticule conveyer and exposure device, reticule conveying manner, treatment manner, and device production manner of reticule

机译:网版输送机和曝光装置,网版输送方式,网版处理方式和装置生产方式

摘要

There is provided a reticle transport apparatus which is capable of preventing any foreign matter from adhering to a reticle. A reticle transport apparatus 4, which transports a reticle with respect to a processing atmospheric chamber 3, includes a reticle loading mechanism 4 which loads the reticle into a processing atmosphere chamber 3, at least a region of the reticle in which a pattern is formed being covered by a cover; a cover unloading mechanism 4 which unloads and out of the processing atmosphere chamber 3, the cover separated from the reticle after the reticle has been transported by the reticle loading mechanism 4; and a cover cleaning mechanism 10 which cleans the cover unloaded by the cover unloading mechanism 4.
机译:提供一种能够防止任何异物附着到掩模版上的掩模版输送装置。将掩模版相对于处理气氛室3进行传输的掩模版输送装置4包括将掩模版加载到处理气氛室3中的掩模版加载机构4,掩模版的至少其中形成有图案的区域被形成。被封面覆盖;罩卸载机构4,该罩卸载机构4从分划板装载机构4搬出分划板后,从分划板分离并从处理气氛室3内取出。盖清洁机构10,其清洁由盖卸载机构4卸载的盖。

著录项

  • 公开/公告号JP5071109B2

    专利类型

  • 公开/公告日2012-11-14

    原文格式PDF

  • 申请/专利权人 株式会社ニコン;

    申请/专利号JP20070551949

  • 发明设计人 山本 一;

    申请日2006-12-25

  • 分类号H01L21/027;G03F1/22;G03F1/64;G03F1/66;

  • 国家 JP

  • 入库时间 2022-08-21 16:56:28

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