Amendment manner null of production error of reticule and exposure device for semiconductor device production

摘要

PURPOSE:To decrease pattern aligning errors by measuring the magnification errors of the production errors of a reticle prior to exposing and executing exposing after correcting the magnification. CONSTITUTION:Marks 4 for correcting the production errors are formed at =4 points at the circumference of pattern forming parts on the reticle. Microscopic errors, distortion of lenses, etc., are removed before measurement of the reticle production errors. Namely, the positional relations between the slit 2 of a microscope 9 and the marks 6 on a stage are measured. The reticle 3 is loaded by the aligner and the mark positions are compared with the marks 6 on the stage through a projecting lens 5. The scanning position of the stage 7 is measured by a laser interference meter 8. The reticle production errors are exactly corrected.