Making use with of record manner, hologram exposure manner, the production manner of the semiconductor and the original reticule where

摘要

PROBLEM TO BE SOLVED: To provide a recording method and a hologram exposure method capable of easily adjusting a focal point depth in hologram exposure without requiring contrivance of the configuration of a hologram exposure apparatus, and to provide a method of manufacturing a semiconductor and a method of manufacturing an electro-optical device.;SOLUTION: This recording method is provided with a first recording step in which a reticle R1 and a hologram mask H1 are oppositely arranged with a predetermined interval G₀, a recording layer 2 is irradiated with a recording beam via the reticle R1, and the recording layer 2 is irradiated with a reference beam at a predetermined incident angle from the hologram mask H1 side; and a second recording step in which the reticle R1 and the hologram mask H1 are offset at a predetermined distance ΔG for a predetermined interval G₀ and oppositely arranged, and the recording layer 2 is simultaneously irradiated with the recording beam and reference beam via the reticle R1. An exposure pattern of the reticle R1 is multiply recorded on the hologram mask H1, and the focal point depth of a reproduction light can be adjusted at the time of hologram exposure.;COPYRIGHT: (C)2008,JPO&INPIT