On surface side of production manner and electrostatic chuck device gas supply structure and the electrostatic chuck device null metal infrastructure

摘要

The goolant gas it gushes in the electrostatic chuck device to which the metal basis (1) has the electrostatic chuck on surface side, it offers the production method of the gas supply structure which can prevent the pollution conversion unevenness conversion and the thermal spray material etc of the quantity with accumulation. Upper insulating layer (6) the baseplate which is made to adsorb on side (W) to be production method of gas supply structure in order to supply on back the goolant gas where the metal basis (1) is supplied from underside side, the gas supply route which the metal basis (1) has via (3), the metal basis (1) spraying the ceramic powder on surface side and it forms lower part insulating layer the process which (4), it forms the adsorption electrode process, and the upper insulating layer which (5) leading the process which it forms (6), lower part insulating layer as the ceramic powder which (4) uses for formation the adhesive which includes the being full filler which consists of the same material (8) with the metal basis(1) the gas supply route exit of surface side (3a) it closes, upper insulating layer (6) the metal basis (1) the gas supply route exit (3a) directs after the forming and opens the hole, the perforation hole which leads to gas supply route (3) (9) it is production method of the gas supply structure which is formed.