The optical lighting section which irradiates the focusing adjustment mannered null exposure light in the exposure device

摘要

PROBLEM TO BE SOLVED: To adjust focus during exposure processing, and to adjust focus in a short time without adding an illuminating means and image receiving means dedicated to focus adjustment.;SOLUTION: This exposure apparatus of a belt-like workpiece projects a pattern formed in a mask M to the belt-like workpiece W to be exposed. A focus adjustment pattern FP for a projector lens is formed inside an alignment mark MAM of the mask M. A light transmitting member 10b is arranged in a through hole of a work stage 10 or on a notch 10a, and a focus adjustment pattern AP for an alignment microscope is formed. Alignment marks of the mask and the belt-like workpiece are detected by the alignment microscope 12, the mask M and the belt-like workpiece W are positioned. The focus adjustment pattern FP for the projector lens and the focus adjustment pattern AP for the alignment microscope are detected, and the focus adjustment is performed by the alignment microscope 12.;COPYRIGHT: (C)2009,JPO&INPIT