首页> 外国专利> Catadioptric projection optical system, projection optical system, and scanning exposure apparatus

Catadioptric projection optical system, projection optical system, and scanning exposure apparatus

机译:折反射式投影光学系统,投影光学系统和扫描曝光装置

摘要

While increasing the projection area, and weight of the optical system is capable of projection optical system. Projection optical system of reflection refraction type to be formed in a projection magnification of the expansion plate (P) on the image of the pattern of the mask (M) in (PL1), in the optical path between the mask (M) and plate (P) and The first lens group concave reflecting mirror disposed between (CCMb), is disposed in an optical path between the mask (M) and the concave reflecting mirror and (CCMb) and (G1b), and the first (CCMb) concave reflecting mirror a second lens group disposed between lens groups and (G1b) and (G2b), is disposed on the optical path between the concave reflecting mirrors (CCMb) plates and (P), rotationally asymmetric at least one and a (G3b) the third lens group including a lens outer shape.
机译:在增加投影面积的同时,光学系统的重量也能够投影光学系统。反射折射型的投影光学系统,是在扩展板(P)在(PL1)中的掩模(M)的图案的图像上,在掩模(M)与板之间的光路中以投影放大倍率形成的(P)和位于(CCMb)之间的第一透镜组凹面反射镜被布置在掩模(M)和凹面反射镜与(CCMb)和(G1b)之间的光路上,而第一(CCMb)凹面反射镜第二透镜组位于透镜组(G1b)和(G2b)之间,位于凹面反射镜(CCMb)板和(P)之间的光路上,至少一个和一个(G3b)旋转不对称,第三透镜组包括透镜外形。

著录项

  • 公开/公告号JP5110076B2

    专利类型

  • 公开/公告日2012-12-26

    原文格式PDF

  • 申请/专利权人 株式会社ニコン;

    申请/专利号JP20090502481

  • 发明设计人 畑田 仁志;熊澤 雅人;

    申请日2008-01-30

  • 分类号G02B17/08;G02B7/02;G02B19/00;G03F7/20;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 16:53:57

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号