Being ion source for the mannered null ion beam evaporation treatment which includes the process which impresses voltage vis-a-vis the ion source for ion beam evaporation treatment

摘要

PROBLEM TO BE SOLVED: To provide an ion source for ion beam deposition comprising multiple anodes, wherein the ion source deposits multiple zones of a source material and thicknesses of at least two of the multiple zones are different.;SOLUTION: When depositing carbon by ion beam deposition, it is often not possible for space reasons or practical for cost reasons to utilize two or more ion sources as the number of process chambers is limited. However, the ion source comprises multiple concentric anodes and different voltages are applied to them, so the thicknesses of at least two of the multiple zones are different.;COPYRIGHT: (C)2010,JPO&INPIT