首页> 外文会议>High-Power Particle Beams, 1998. BEAMS '98. Proceedings of the 12th International Conference on >High-current pulse sources of broad gaseous and metallic ion beams for surface treatment applications
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High-current pulse sources of broad gaseous and metallic ion beams for surface treatment applications

机译:宽气体和金属离子束的高电流脉冲源,用于表面处理应用

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The paper reviews the experimental study and development of technological ion sources performed under a joint IEP-IHCE program for recent years. The sources are based on pulsed high-current glow and arc discharges and are designed for surface treatment applications. The use of cold cathodes makes the sources more reliable when operated under elevated residual gas pressure and at the presence of reactive gases, while the use of a repetitive pulse mode of plasma production provides optimum conditions for stable operation of the discharge, for controlling the average beam current over a wide range, and for formation of homogeneous broad ion beams. The electrode systems used in the ion sources provide for operation of high-current discharges at low pressures, production of stable, dense, and homogeneous plasmas, and decrease the impurities content in the beam. Some design versions of the sources developed are presented that are capable of producing /spl sim/1-10 mA/cm/sup 2/ of current density in beams with a cross section of some hundreds of square centimeters at accelerating voltages of 10-100 kV, pulse durations of 10-10/sup 3/ /spl mu/s, and pulse repetition rates of 1-500 Hz. Some applications of the sources for surface modification of materials are described.
机译:本文回顾了近年来在IEP-IHCE联合计划下进行的技术离子源的实验研究和开发。这些源基于脉冲的大电流辉光和电弧放电,专为表面处理应用而设计。当在升高的残余气体压力下和存在反应性气体的情况下运行时,冷阴极的使用可使离子源更加可靠,而等离子体产生的重复脉冲模式的使用为放电的稳定运行提供了最佳条件,从而可控制平均值离子束电流在很宽的范围内,并用于形成均匀的宽离子束。离子源中使用的电极系统可在低压下进行大电流放电,产生稳定,密集和均质的等离子体,并减少电子束中的杂质含量。提出了一些开发源的设计版本,这些版本能够在10-100的加速电压下,在截面为几百平方厘米的光束中产生电流密度的/ spl sim / 1-10 mA / cm / sup 2 / kV,脉冲持续时间为10-10 / sup 3 / / spl mu / s,脉冲重复频率为1-500 Hz。描述了用于材料的表面改性的来源的一些应用。

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