Electron-beam deposition system, has trailing-indicator monitor measuring past evaporation performance of evaporation source, and leading-indicator monitor measuring future evaporation performance of evaporation source

摘要

The system has a trailing-indicator monitor (40) measuring a past evaporation performance of an evaporation source and has a trailing-indicator output. A leading-indicator monitor (62) measures a future evaporation performance of the source and has a leading-indicator output. A controller receives both the outputs, and controls an electron-beam source responsive to the trailing output and to the leading-indicator output.