Reflected die photo mask blank, reflected die photo mask, the inspection manner and survey instrument

摘要

PROBLEM TO BE SOLVED: To provide a reflection type photomask blank by which contrast between a pattern opened part and a pattern non-opened part of a reflection type photomask can be increased, and a pattern can be inspected easily, and to provide the reflection type photomask, and an inspection method and an inspection device of the same.;SOLUTION: The reflection type photomask blank includes a substrate, a reflection film formed on the substrate, a luminescent layer formed on the reflection film and emitting light when a voltage is applied, an absorber formed on the luminescent layer and absorbing exposure light.;COPYRIGHT: (C)2010,JPO&INPIT