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Conference on Photomask and Next-Generation Lithography Mask Technology

召开年：2008
召开地：Yokohama(JP)
出版时间：-

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1.Advanced Damage-free Photomask Cleaning for 45/32nm Technology Nodes

机译：适用于45 / 32nm技术节点的高级无损光掩模清洗
- 作者：Roman Gouk;Jason Jeon;Fred Li;James Papanu;Banqiu Wu;Rao Yalamanchili
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- cleaning;
- damage-free;
- SRAF;
- assist features;
- 45 nm;
- 32 nm;
2.AF Fixer: New incremental OPC method for optimizing Assist Feature

机译：AF Fixer：新的增量式OPC方法，用于优化辅助功能
- 作者：Sung-Gon Jung;Sang-Wook Kim;Sung-Soo Suh;Young-Chang Kim;Suk-Joo Lee;Sung-Woon Choi;Woo-Sung Han;Joo-Tae Moon;Levi D. Barnes;Xiaohai Li;Robert M. Lugg;Sooryong Lee;Kyoil Koo;Munhoe Do;Frank P. Amoroso;Benjamin Painter
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- assist feature(af);
- incremental opc;
- DOF;
- pw model;
3.IntenCD~(TM): an application for CD Uniformity mapping of photomask and process control at maskshops

机译：IntenCD〜（TM）：在光罩车间进行光罩CD均匀性映射和过程控制的应用程序
- 作者：Heebom Kim;MyoungSoo Lee;Sukho Lee;Young-Su Sung;Byunggook Kim;Sang-Gyun Woo;HanKu Cho;Michael Ben Yishai;Lior Shoval;Christophe Couderc
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- CDU;
- aerial image;
- mask inspection;
4.Fast Integrated Die-to-Die Transmitted, Reflected and STARlight-2~(TM) Defect Inspection on Memory Masks

机译：对存储器掩模进行快速集成的芯片到芯片的透射，反射和STARlight-2〜（TM）缺陷检查
- 作者：Andy Lan;Jenny Hsu;Swapnajit Chakravarty;Vincent Hsu;Ellison Chen;Eric Lu;John Miller
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- mask inspection;
- productivity;
- terascanhr;
- sensitivity;
- fast integrated t+r and sl2;
5.Reliable measurement method for complicated OPC pattern

机译：复杂OPC模式的可靠测量方法
- 作者：Tastuya Aihara;Shinpei Kondo;Masaru Higuchi
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- OPC;
- cd-sem;
- CD;
- area measurement;
- closed pattern;
- distance measurement;
- unclosed pattern;
- ROI;
- distance roi;
- image tilt;
- area scan;
6.Logic Device Scaling Trend in ITRS 2007

机译：ITRS 2007中的逻辑设备扩展趋势
- 作者：Kiyotaka Imai
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- itrs;
- scaling;
- metal gate;
- high-k dielectric;
- finfet;
- ballistic transport;
- ge channel;
- iii-v channel;
- nanowire;
7.The Ultimate Chrome Absorber in Photomask-making

机译：光掩模制造中的终极铬吸收剂
- 作者：Masahiro Hashimoto;Hiroyuki Iwashita;Atsushi Kominato;Hiroaki Shishido;Masao Ushida;Hideaki Mitsui
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- 193nm-lithography;
- 32nm node;
- cr absorber;
- phase-shift;
- tfc;
- CAR;
- blanks;
- cd linearity;
- resolution;
- dry-etching;
8.Distributed Processing (DP) Based E-beam Lithography Simulation with Long Range Correction Algorithm in E-beam machine

机译：基于分布式处理（DP）的电子束机器中基于远程校正算法的电子束平版印刷仿真
- 作者：Won-Tai Ki;Ji-Hyeon Choi;Byung-Gook Kim;Sang-Gyun Woo;Han-Ku Cho
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- photomask;
- e-beam lithography;
- e-beam simulation;
- fogging effect correction;
- distributed processing (dp);
9.Selete EUV Reticle Shipping and Storage Test Results

机译：选择EUV标线运输和存储测试结果
- 作者：Kazuya Ota;Mitsuaki Amemiya;Takao Taguchi;Osamu Suga
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- EUVL;
- mask handling;
- mask carrier;
- reticle pod;
- particle;
- shipping test;
- storage test;
- dual pod;
10.Damage analysis of EUV mask under Ga focused ion beam irradiation

机译：Ga聚焦离子束辐照EUV掩模的损伤分析
- 作者：Yasushi Nishiyama;Tsuyoshi Amano;Hiroyuki Shigemura;Tsuneo Terasawa;Osamu Suga;Tomokazu Kozakai;Syuichi Kikuchi;Kensuke Shiina;Anto Yasaka;Ryoji Hagiwara
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- EUV;
- mask;
- defects;
- repair;
- FIB;
- damage;
11.Yield-Centric Layout Optimization with Precise Quantification ofLithographic Yield Loss

机译：精确量化平版印刷产量损失的以产量为中心的布局优化
- 作者：Sachiko Kobayashi;Suigen Kyoh;Koichi Kinoshita;Yukihiro Urakawa;Eiji Morifuji;Satoshi Kuramoto;Soichi Inoue
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- OPC;
- RET;
- DFM;
- design rule;
- yield;
- hot spot;
- layout optimization;
12.Describing Litho-Constrained Layout by a High-Resolution ModelFilter

机译：通过高分辨率模型过滤器描述光刻限制的版式
- 作者：Min-Chun Tsai
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- litho-constrained layout;
- high resolution modeling;
- design;
- manufacturing;
13.Optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction

机译：优化MDP，掩模写入和掩模检查以降低掩模制造成本
- 作者：Masaki Yamabe
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- MDP;
- mask writing;
- mask inspection;
- mask data rank (mdr);
- design intent;
- character projection (cp);
- multi column cell (mcc);
14.A Study of Mask Specification in Spacer Patterning Technology

机译：间隔物图案化技术中的掩模规格研究
- 作者：Hidefumi Mukai;Yuuji Kobayashi;Shinji Yamaguchi;Kenji Kawano;Kohji Hashimoto
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- spacer patterning process;
- cd budget;
- local cd uniformity;
- global cd uniformity;
15.Mask Transmission Resonance in bi-layer masks

机译：双层掩模中的掩模透射共振
- 作者：Vicky Philipsen;Peter De Bisschop;Kei Mesuda
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- mask transmission resonance;
- negative meef;
- mask 3d effects;
- hyper-na lithography;
- wafer evaluation;
16.Wafer Plane Inspection for Advanced Reticle Defects

机译：晶圆平面检查，以解决高级分划板缺陷
- 作者：Rajesh Nagpal;Firoz Ghadiali;Jun Kim;Tracy Huang;Song Pang
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- wafer plane inspection;
- reticle inspection;
- residue chrome;
- contamination;
- lithography simulation;
17.The study to optimize CD uniformity by reliable area CD measurement on 45nm D/R DRAM

机译：通过在45nm D / R DRAM上进行可靠的区域CD测量来优化CD均匀性的研究
- 作者：Yongkyoo Choi;Sunghyun Oh;munsik Kim;Yongdae Kim;Changreol Kim
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- field cd uniformity;
- mask cd;
- area cd;
- spatial filtering;
- correlation;
- light transmittance control;
18.Mask and Wafer Cost of Ownership (COO) from 65 to 22 nmHalf-Pitch Nodes

机译：掩模和晶圆的拥有成本（COO）从65到22 nm
- 作者：Greg Hughes;Lloyd C. Litt;Andrea Wueest;Shyam Palaiyanur
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
19.Phase shift mask etch process development utilizing a scatterometry-based metrology tool

机译：利用基于散射测量技术的相移掩模蚀刻工艺开发
- 作者：Jason Plumhoff;Alexander Gray
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
20.Application of two-fluid nozzles for advanced photomask cleaning process cleaning process

机译：两液喷嘴在先进的光掩模清洗工艺清洗工艺中的应用
- 作者：Kenji Masui;Tetsuo Takemoto;Kyo Otsubo;Mari Sakai;Tomotaka Higaki;Hidehiro Watanabe;Tsutomu Kikuchi;Yoshiaki Kurokawa
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
21.Multi Column Cell (MCC) E-beam Exposure Systemfor Mask Writing

机译：用于掩模写入的多列单元（MCC）电子束曝光系统
- 作者：Hiroshi Yasuda;Akio Yamada;Masaki Yamabe
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- e-beam mask writer;
- throughput;
- multi column;
- character projection;
22.Mask image position correction for double patterning lithography

机译：掩模图像位置校正，用于双图案光刻
- 作者：Masato Saito;Masamitsu Itoh;Osamu Ikenaga;Kazutaka Ishigo
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- bending;
- distortion;
- flatness;
- correction;
- image placement accuracy;
- chuck;
23.Case Study: The Impact of VSB Fracturing

机译：案例研究：VSB压裂的影响
- 作者：Brian Dillon;Tim Norris
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- fracture;
- vsb;
- yield;
- sliver;
24.Impact of Patterning Strategy on Mask FabricationBeyond 32nm

机译：构图策略对32nm以上掩模制造的影响
- 作者：Shoji Mimotogi;Tomotaka Higaki;Hideki Kanai;Satoshi Tanaka;Masaki Satake;Yosuke Kitamura;Katsuyoshi Kodera;Kazutaka Ishigo;Takuya Kono;Masafumi Asano;Kazuhiro Takahata;Soichi Inoue
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- double patterning;
- mask specification;
- low-k1 lithography;
- 22nm node;
25.Printability Impact of Progressive Defects: Ammonium SulfateEmulation Study

机译：渐进性缺陷的可印刷性影响：硫酸铵模拟研究
- 作者：Brian Grenon;Tracy Huang;Aditya Dayal;Kaustuve Bhattacharyya
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- progressive defect;
- magnesium sulfate;
- cyanuric acid;
- ammonium sulfate;
- defect inspection;
- ammonium oxalate;
- MEEF;
26.Prevention of chemical residue from growing into Haze defect on PSM pattern edge after normal cleaning process

机译：正常清洗后，防止化学残留物在PSM图案边缘生长为雾状缺陷
- 作者：Jaehyuck Choi;Jin-sik Jung;Han-shin Lee;Jongkeun Oh;Soojung Kang;Haeyong Jeong;Yonghoon Kim;HanKu Cho
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
27.Mask CD Control (CDC) Using AIMS as the CD Metrology Data Source

机译：使用AIMS作为CD计量数据源的模板CD控制（CDC）
- 作者：Guy Ben-Zvi;Eitan Zait;Vladimir Dmitriev;Steven Labovitz;Erez Graitzer;Klaus Boehm;Robert Birkner;Thomas Scheruebl
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
28.Model Based Short Range Mask Process Correction

机译：基于模型的短程掩模工艺校正
- 作者：G. Chen;J-S. Wang;S. Bai;R. Howell;J. Wiley;A. Vacca;T. Kurosawa;T. Nishibe;T. Takigawa
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
29.Hybrid Resist Model to Enhance Continuous Process Window Modelfor OPC

机译：混合抵抗模型可增强OPC的连续过程窗口模型
- 作者：Qiaolin (Charlie) Zhang;Kevin Lucas
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
30.32 nm imprint masks using variable shape beam pattern generators

机译：使用可变形状光束图案发生器的32 nm压印掩模
- 作者：Kosta Selinidis;Ecron Thompson;Gerard Schmid;Nick Stacey;Joseph Perez;John Maltabes;Douglas J. Resnick;Jeongho Yeo;Hoyeon Kim;Ben Eynon
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- s-fil;
- template;
- imprint lithography;
- full field;
- overlay;
- pattern transfer;
- nand flash;
31.ACLV Degradation: Root Cause Analysis and Effective MonitoringStrategy

机译：ACLV降级：根本原因分析和有效监控策略
- 作者：Anna Tchikoulaeva;Andre Holfeld;Markus Arend;Eugen Foca
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- reticle;
- cd degradation;
- aclv monitoring;
- transmission loss;
32.Resist Pattern Inspection Function for LM7500 Reticle Inspection System

机译：LM7500标线检查系统的抗蚀图检查功能
- 作者：Hideyuki Moribe;Yoshikazu Kato;Kazuyoshi Nakamura;Takeshi Bashomatsu;Takahiro Igeta;Kazuhito Ogihara;Takehiko Okada
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- defect inspection;
- resist pattern;
33.Controlling Phase Induced CD Non-uniformity Effects of PSMPhoto-masks

机译：控制相位引起的PSM光掩模的CD不均匀效应
- 作者：Dan Rost;Michael Ben-Yishai;Lior Shoval;Christophe Couderc
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- mask;
- phase monitoring;
- intencd;
34.Mask CD compensation method using diffraction intensity for lithography equivalent metrology

机译：光刻等效计量中使用衍射强度的掩模CD补偿方法
- 作者：Takaharu Nagai;Takanori Sutou;Yuichi Inazuki;Hiroyuki Hashimoto;Nobuhito Toyama;Yasutaka Morikawa;Hiroshi Mohri;Naoya Hayashi
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- diffraction intensity;
- cd-sem;
- 3d mask model;
- MEEF;
- hole measurement;
35.OPC model enhancement using parameter sensitivity methodology

机译：使用参数敏感性方法增强OPC模型
- 作者：Brian S. Ward;Martin Drapeau
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- hyper na lithography;
- OPC;
- model calibration;
36.Source Optimization and Mask Design to Minimize MEEF in Low k_1Lithography

机译：低k_1光刻中的光源优化和掩模设计，以最小化MEEF
- 作者：Guangming Xiao;Tom Cecil;Lingyong Pang;Bob Gleason;John McCarty
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- MEEF;
- design for manufacturing (dfm);
- RET;
- inverse lithography technology (ilt);
37.Separable OPC Models for Computational Lithography

机译：用于计算光刻的可分离OPC模型
- 作者：Hua-Yu Liu;Qian Zhao;J. Fung Chen;Jiong Jiang;Robert Socha;Eelco Van Setten;Andre Engelen;Jeroen Meessen;Michael M Crouse;Mu Feng;Wenjin Shao;Hua Cao;Yu Cao;Lieve Van Look;Joost Bekaert;Geert Vandenberghe;Jo Finders
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- optical proximity correction;
- OPC;
- opc model;
- 3d mask models;
- separable models;
38.Extension of the 2D-TCC technique to optimize mask pattern layouts

机译：扩展2D-TCC技术以优化掩模图案布局
- 作者：Manabu Hakko;Kenji Yamazoe;Miyoko Kawashima;Yoshiyuki Sekine;Masakatsu Ohta;Tokuyuki Honda
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- resolution enhancement technology;
- RET;
- 2d-tcc;
- electromagnetic;
- EMF;
- MEEF;
- defect;
39.The Lithography Technology for the 32 nm HP and Beyond

机译：适用于32 nm及更高波长的光刻技术
- 作者：Mircea Dusa;Bill Arnold;Jo Finders;Hans Meiling;Koen van Ingen Schenau;Alek C. Chen
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- double patterning technology (dpt);
- DPL;
- LELE;
- spacer self-aligned;
- dpt cdu populations;
- EUV;
40.Rigorous Vectorial Modeling for Polarized Illumination andProjection Pupil in OPC

机译：OPC中偏振照明和投影瞳孔的严格矢量建模
- 作者：Qiaolin (Charlie) Zhang;Hua Song;Kevin Lucas;Brian Ward;James Shiely
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
41.A Novel Approach: High Resolution Inspection with Wafer Plane Defect Detection

机译：一种新颖的方法：具有晶圆平面缺陷检测的高分辨率检查
- 作者：Carl Hess;Mark Wihl;Rui-fang Shi;Yalin Xiong;Song Pang
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
42.MoSi absorber photomask for 32 nm node

机译：用于32 nm节点的MoSi吸收剂光掩模
- 作者：Toshio Konishi;Yosuke Kojima;Hiroyuki Takahashi;Masato Tanabe;Takashi Haraguchi;Matthew Lamantia;Yuichi Fukushima;Yoshimitsu Okuda
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- 32nm node;
- immersion lithography;
- attenuated phase shift mask;
- binary mask;
- mosi absorber;
43.Photomask technology for 32nm node and beyond

机译：适用于32nm及更高节点的光掩模技术
- 作者：Ryugo Hikichi;Hiroyuki Ishii;Hidekazu Migita;Noriko Kakehi;Mochihiro Shimizu;Hideyoshi Takamizawa;Tsugumi Nagano;Masahiro Hashimoto;Hiroyuki Iwashita;Toshiyuki Suzuki;Mono Hosoya;Yasushi Ohkubo;Masao Ushida;Hideaki Mitsui
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- 193nm-lithography;
- 32nm node;
- phase-shift;
- binary;
- blanks;
- cog;
- coms;
- cd linearity;
- resolution;
- dry-etching;
44.Linewidth Roughness Characterization in Step and Flash ImprintLithography

机译：阶跃和Flash压印光刻中的线宽粗糙度表征
- 作者：Gerard M. Schmid;Niyaz Khusnatdinov;Cynthia B. Brooks;Dwayne LaBrake;Ecron Thompson;Douglas J. Resnick
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- s-fil;
- template;
- imprint mask;
- imprint lithography;
- linewidth roughness;
- LWR;
- LER;
45.Modeling of charging effect and its correction by EB mask writerEBM-6000

机译：EB掩模写入器EBM-6000对充电效果的建模及其校正
- 作者：Noriaki Nakayamada;Seiji Wake;Takashi Kamikubo;Hitoshi Sunaoshi;Shuichi Tamamushi
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- electron beam mask writer;
- double patterning;
- pattern placement accuracy;
- overlay accuracy;
- surface charging effect;
46.Metrology of EUV Masks by EUV-Scatterometry and FiniteElement Analysis

机译：通过极紫外散射法和有限元分析实现极紫外掩模的计量
- 作者：Jan Pomplun;Sven Burger;Frank Schmidt;Frank Scholze;Christian Laubis;Uwe Dersch
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- EUV;
- mask;
- metrology;
- photolithography;
- FEM;
47.Model-based mask verification on critical 45nm logic masks

机译：在关键的45nm逻辑掩模上进行基于模型的掩模验证
- 作者：F. Sundermann;F. Foussadier;T. Takigawa;J. Wiley;A. Vacca;L. Depre;G. Chen;S. Bai;J-S. Wang;R.Howell;V. Arnoux;K. Hayano;S. Narukawa;S. Kawashima;H. Mohri;N. Hayashi;H. Miyashita;Y.Trouiller;F. Robert;F. Vautrin;G. Kerrien;J. Planchot;C. Martinelli;J.L. Di-Maria;V. Farys;B. Vandewalle;L. Perraud;JC. Le Denmat;A. Villaret;C. Gardin;E. Yesilada;M. Saied
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
48.Scanner fleet management utilizing programmed hotspot patterns

机译：利用编程的热点模式进行扫描仪车队管理
- 作者：Kenji Yoshida;Soichi Inoue;Koji Hashimoto;Satoshi Tanaka;Masaki Satake;Takashi Obara;Kazuhiro Takahata;Eiji Yamanaka;Mitsuyo Kariya;Hiroyuki Morinaga;Shoji Mimotogi
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
49.Model-based SRAF Insertion through Pixel-based Mask Optimizationat 32nm and beyond

机译：通过基于像素的32nm及以上掩模优化实现基于模型的SRAF插入
- 作者：Kyohei Sakajiri;Alexander Tritchkov;Yuri Granik
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- inverse lithography;
- assist features;
- mask equalization;
50.'What You See is What You Print': Aerial Imaging as an Optimal Discriminator Between Printing and Non-Printing Photomask Defects

机译：“您所看到的就是您所打印的内容”：航空成像是打印和非打印光掩模缺陷之间的最佳区分
- 作者：Amir Sagiv;Shmoolik Mangan
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- mask inspection;
- aerial imaging;
51.Practical Application of Aerial Imaging Mask Inspection for memory devices

机译：航空成像掩模检测在存储设备中的实际应用
- 作者：Hyun Joo Baik;Dong Hoon Chung;Yong Hoon Kim;Han Ku Cho;Amir Sagiv;Shmoolik Mangan;Ziv Parizat;Eun Young Park;Yaniv Brami;Dana Bernstein
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- aerial imaging inspection;
- defect signal;
- cd variation;
- mask inspection;
52.Nanomachining processes for 45, 32 nm node mask repair-and beyond

机译：用于45和32 nm节点掩模修复的纳米加工工艺
- 作者：Tod Robinson;Andrew Dinsdale;Ron Bozak;Roy White;Michael Archuletta
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年
- nanomachining;
- high aspect mask repair;
- 45 nm node;
- 32 nm node;
- CPL;
- eapsm;
- cr binary;
- mosi epsm;
- high aspect tips;
- particle cleaning;
53.Predictive Modeling of Lithography-Induced Linewidth Variation

机译：光刻技术引起的线宽变化的预测建模
- 作者：Andrew B. Kahng;Swamy V. Muddu
- 会议名称：《Conference on Photomask and Next-Generation Lithography Mask Technology》 | 2008年