首页> 外国专利> HETEROJUNCTION BIPOLAR TRANSISTOR WITH REDUCED SUB-COLLECTOR LENGTH, METHOD OF MANUFACTURE AND DESIGN STRUCTURE

HETEROJUNCTION BIPOLAR TRANSISTOR WITH REDUCED SUB-COLLECTOR LENGTH, METHOD OF MANUFACTURE AND DESIGN STRUCTURE

机译:子集尘器长度减小的异质结双极晶体管,制造方法和设计结构

摘要

A heterojunction bipolar transistor (HBT) structure, method of manufacturing the same and design structure thereof are provided. The HBT structure includes a semiconductor substrate having a sub-collector region therein. The HBT structure further includes a collector region overlying a portion of the sub-collector region. The HBT structure further includes an intrinsic base layer overlying at least a portion of the collector region. The HBT structure further includes an extrinsic base layer adjacent to and electrically connected to the intrinsic base layer. The HBT structure further includes an isolation region extending vertically between the extrinsic base layer and the sub-collector region. The HBT structure further includes an emitter overlying a portion of the intrinsic base layer. The HBT structure further includes a collector contact electrically connected to the sub-collector region. The collector contact advantageously extends through at least a portion of the extrinsic base layer.
机译:提供了一种异质结双极晶体管(HBT)结构,其制造方法及其设计结构。 HBT结构包括其中具有子集电极区的半导体衬底。 HBT结构还包括覆盖子收集器区域的一部分的收集器区域。 HBT结构还包括覆盖至少一部分集电极区的本征基极层。 HBT结构还包括与本征基层相邻并电连接到本征基层的非本征基层。 HBT结构还包括在非本征基极层和子集电极区之间垂直延伸的隔离区。 HBT结构还包括覆盖本征基层的一部分的发射极。 HBT结构还包括电连接到子集电极区域的集电极触点。集电极接触有利地延伸穿过非本征基层的至少一部分。

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