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METHODS AND SYSTEMS FOR INSPECTING STRUCTURES FOR CRYSTALLOGRAPHIC IMPERFECTIONS
METHODS AND SYSTEMS FOR INSPECTING STRUCTURES FOR CRYSTALLOGRAPHIC IMPERFECTIONS
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机译:用于检查晶体缺陷的结构的方法和系统
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摘要
Embodiments of methods and systems for inspecting a structure for a crystallographic imperfection are provided. In the method, an X-ray wavelength that is particularly susceptible to diffraction by the crystallographic imperfection is identified. Then an X-ray source is provided to emit X-rays in the identified X-ray wavelength. While placing the structure at a sequence of positions relative to the X-ray source, X-rays are directed at the structure in multiple, non-parallel arrays to create sequential patterns of diffracted X-rays. The patterns of diffracted X-rays are digitally captured and communicated to a computer that compares them to locate the crystallographic imperfection. For a surface imperfection, the imperfection may be marked with a target to allow for physical removal.
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