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Methods of forming SiC MOSFETs with high inversion layer mobility
Methods of forming SiC MOSFETs with high inversion layer mobility
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机译:形成具有高反转层迁移率的SiC MOSFET的方法
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Methods of forming an oxide layer on silicon carbide include thermally growing an oxide layer on a layer of silicon carbide, and annealing the oxide layer in an environment containing NO at a temperature greater than 1175° C. The oxide layer may be annealed in NO in a silicon carbide tube that may be coated with silicon carbide. To form the oxide layer, a preliminary oxide layer may be thermally grown on a silicon carbide layer in dry O2, and the preliminary oxide layer may be re-oxidized in wet O2.
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