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Bonding film composition for semiconductor assembly, bonding film therefrom, and dicing die bond film comprising the same

机译:用于半导体组件的接合膜组合物,由其形成的接合膜以及包括该接合膜组合物的切割芯片接合膜

摘要

A die bonding film composition for semiconductor assembly may include an elastomer resin containing a hydroxyl group, a carboxyl group, or an epoxy group. The die bonding film composition may also include a film forming resin having a glass transition temperature (Tg) in the range of about 0 to 200° C., an epoxy resin, a phenol resin, a hardener, a silane coupling agent, and a filler.
机译:用于半导体组件的管芯键合膜组合物可以包含含有羟基,羧基或环氧基的弹性体树脂。芯片键合膜组合物还可包含玻璃化转变温度(Tg)在约0至200℃的范围内的成膜树脂,环氧树脂,酚醛树脂,硬化剂,硅烷偶联剂,和填料。

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