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Source of photons resulting from a recombination of localized excitons
Source of photons resulting from a recombination of localized excitons
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机译:局部激子复合产生的光子源
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摘要
A source of photons resulting from a recombination of localized excitons, including a semiconductor layer having a central portion surrounded with heavily-doped regions; above said central portion, a layer portion containing elements capable of being activated by excitons, coated with a first metallization; and under the semiconductor layer, a second metallization of greater extension than the first metallization. The distance between the first and second metallizations is on the order of from 10 to 60 nm; and the lateral extension of the first metallization is on the order of from λ0/10*ne to λ0/2*ne, where λ0 is the wavelength in vacuum of the emitted light and ne is the effective refractive index of the mode formed in the cavity created by the two metallizations.
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机译:局部激子复合产生的光子源,其半导体层的中心部分被重掺杂区包围;在所述中央部分上方,是一层部分,该部分含有能被激子激活的元素,并涂有第一金属层。在所述半导体层之下,具有比所述第一金属化层更大延伸的第二金属化层。第一金属化层与第二金属化层之间的距离为10至60nm的数量级;第二金属化层与第二金属化层之间的距离约为10至60nm。第一次金属化的横向延伸量为λ0/ 10 * n e Sub>到λ0/ 2 * n e Sub>,其中λ0是真空中的波长发射的光和n e Sub>是两个金属化在空腔中形成的模的有效折射率。
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