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Metal film polishing pad and method for polishing metal film using the same
Metal film polishing pad and method for polishing metal film using the same
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机译:金属膜抛光垫以及使用该金属膜抛光垫的方法
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摘要
The invention provides a polishing pad to polish a metal layer. The polishing pad has a storage elastic modulus at 80° C. of 200 to 900 MPa and a storage elastic modulus at 110° C. of 40 MPa or less. The invention also provides a method of polishing a metal layer using the pad.
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