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Radiant anneal throughput optimization and thermal history minimization by interlacing
Radiant anneal throughput optimization and thermal history minimization by interlacing
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机译:通过隔行扫描进行辐射退火吞吐量优化和热历史最小化
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摘要
The time between illumination of adjacent zones of a workpiece edge is extended by a long cool-down period or delay, by interlacing a radiation beam scanning pattern. During the cool-down period, the beam successively scans (along the fast axis) two rows separated by about half the wafer diameter, and travels back and then forth (along the slow axis) across the distance between the two rows, while the radiation beam source continuously generates the beam.
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