APPARATUS FOR PLASMA GENERATION, METHOD FOR MANUFACTURING ROTATING ELECTRODES FOR PLASMA GENERATION APPARATUS, METHOD FOR PLASMA TREATMENT OF SUBSTRATE, AND METHOD FOR FORMING THIN FILM OF MIXED STRUCTURE USING PLASMA

摘要

According to one embodiment of the present invention, provided is an apparatus for plasma generation, comprising: a plate-like lower electrode for mounting a substrate to generate stable and high-density plasma near atmospheric pressure by suppressing a phenomenon in which plasma is transferred to an arc; a conductive body, which comprises a cylindrical rotating electrode on the plate-like lower electrode, wherein the cylindrical rotating electrode is connected to a power source unit, and a plurality of capillary units on an outer circumferential surface thereof; and other portions which are covered with insulators or dielectrics to expose the bottom of the plurality of capillary units.