METHOD FOR PRODUCING GLASS SUBSTRATE WITH SILICON OXIDE FILM CONTAINING INORGANIC FINE PARTICLES

摘要

Provided is a method for producing a glass substrate with a silicon oxide film containing inorganic fine particles, wherein inorganic fine particles having a desired particle diameter can be used in accordance with objective optical characteristics and there is a wide range of choices for inorganic fine particles.A silicon oxide film (12) containing inorganic fine particles is formed by applying a coating liquid onto a glass substrate (10), said coating liquid containing inorganic fine particles (14), a hydrolysis product of an alkoxysilane, and water and/or a (poly)ethylene glycol; or alternatively, a silicon oxide film containing inorganic fine particles is formed by applying a coating liquid onto a glass ribbon when a glass substrate is produced by molding molten glass into the glass ribbon and slowly cooling and then cutting the glass ribbon, said coating liquid containing inorganic fine particles, a hydrolysis product of an alkoxysilane, and water and/or a (poly)ethylene glycol.