首页>
外国专利>
PATTERN FORMATION METHOD CAPABLE OF OBTAINING DISSOLUTION CONTRAST AND HIGH-SENSITIVITY
PATTERN FORMATION METHOD CAPABLE OF OBTAINING DISSOLUTION CONTRAST AND HIGH-SENSITIVITY
展开▼
机译:具有溶解对比度和高灵敏度的图案形成方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
PURPOSE: A pattern formation method is provided to stably forming highly precise micro-patterns.;CONSTITUTION: A pattern formation method comprises the following steps: forming a resist film by coating a substrate with a resin composition; exposing the resist film; and developing the resist film by using a negative developer containing an organic solvent. The resin composition includes a specific resin. The specific resin has one or more recurring units having a partial structure which includes alicyclic hydrocarbon represented by chemical formula pI or pII.;COPYRIGHT KIPO 2013
展开▼