首页> 外国专利> POWER SEMICONDUCTOR DEVICE WITH AN IMPROVED BREAKDOWN VOLTAGE PROPERTY AND AN ON-RESISTANCE PROPERTY

POWER SEMICONDUCTOR DEVICE WITH AN IMPROVED BREAKDOWN VOLTAGE PROPERTY AND AN ON-RESISTANCE PROPERTY

机译:具有改进的击穿电压特性和导通电阻特性的功率半导体器件

摘要

PURPOSE: A power semiconductor device is provided to obtain a high breakdown voltage by reducing electric field crowding generated in the edge part of a P-N junction structure with a stripe shape.;CONSTITUTION: An active region(120) is formed with a preset thickness and density on a semiconductor substrate(110) and includes n type first regions and p type second regions. An impurity region(130) includes a p type well region(131) and an n type source region(133). A gate region(140) overlaps a source region in a p well region. A source electrode(150) is electrically connected to the source region.;COPYRIGHT KIPO 2013
机译:目的:提供一种功率半导体器件,以通过减少在具有条纹形状的PN结结构的边缘部分中产生的电场拥挤来获得高击穿电压。组成:有源区(120)形成有预定的厚度,半导体衬底(110)上具有高密度,并且包括n型第一区域和p型第二区域。杂质区(130)包括p型阱区(131)和n型源极区(133)。栅极区域(140)在p阱区域中与源极区域重叠。源电极(150)电连接到源区域。; COPYRIGHT KIPO 2013

著录项

  • 公开/公告号KR20130011006A

    专利类型

  • 公开/公告日2013-01-30

    原文格式PDF

  • 申请/专利权人 KEC CORPORATION;

    申请/专利号KR20110071867

  • 发明设计人 KIM TAE WAN;

    申请日2011-07-20

  • 分类号H01L29/78;H01L21/336;

  • 国家 KR

  • 入库时间 2022-08-21 16:27:47

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号