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METHOD FOR MANUFACTURING ITO NANORODS USING RF MAGNETRON SPUTTERING
METHOD FOR MANUFACTURING ITO NANORODS USING RF MAGNETRON SPUTTERING
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机译：利用射频磁控溅射制备ITO纳米粒子的方法
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摘要
PURPOSE: A method for manufacturing ITO nanorods using RF magnetron sputtering is provided to cheaply produce a large amount of ITO nanorods at a low temperature.;CONSTITUTION: A method for manufacturing ITO nanorods using RF magnetron sputtering comprises: a step of inserting a substrate into an RF magnetron sputtering chamber with an ITO target; and a step of outputting the substrate with the ITO nanorods from the chamber; and a step of performing thermal treatment at 230-270 deg. C for 30 minutes to two hours.;COPYRIGHT KIPO 2013
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机译：目的：提供一种利用RF磁控溅射制造ITO纳米棒的方法，以廉价地在低温下生产大量的ITO纳米棒。;构成：一种利用RF磁控溅射制造ITO纳米棒的方法，包括：将衬底插入具有ITO靶的RF磁控溅射室;从腔室输出具有ITO纳米棒的基板。在230-270度进行热处理的步骤。 C 30分钟到2个小时。; COPYRIGHT KIPO 2013
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