首页> 外国专利> APPARATUS AND METHOD FOR MEASURING AN AERIAL IMAGE OF AN EUV MASK CAPABLE OF MEASURING A SPACE IMAGE OF THE EUV MASK

APPARATUS AND METHOD FOR MEASURING AN AERIAL IMAGE OF AN EUV MASK CAPABLE OF MEASURING A SPACE IMAGE OF THE EUV MASK

机译:用于测量能够测量EUV面罩的空间图像的EUV面罩的航空图像的装置和方法

摘要

PURPOSE: An apparatus for measuring an aerial image of an EUV mask is provided to improve light efficiency, and to improve quality of a space image by reducing the influence of EUV light reflected from a mask.;CONSTITUTION: An apparatus for measuring an aerial image of an EUV mask comprises: an EUV light generating part(10) generating extreme ultraviolet light; a movement part(35) which moves the EUV mask(40) along the x or y axis; a first reduction optical system(510) primarily reducing divergence of the EUV light; a second reduction optical system(540) which secondarily reduces the divergence of the EUV light to concentrate the light into the EUV mask; and a detection part(50) senses energy of EUV light reflected from all regions of the EUV mask.;COPYRIGHT KIPO 2013;[Reference numerals] (11) Light source
机译:目的:提供一种用于测量EUV掩模的航空图像的设备,以通过减少从掩模反射的EUV光的影响来提高光效率并提高空间图像的质量。;构成:一种用于测量航空图像的设备极紫外光掩模的特征在于,包括:极紫外光产生部(10),产生极紫外光。移动部分(35),其使EUV掩模(40)沿x或y轴移动;第一减少光学系统(510),主要减少EUV光的发散;第二减少光学系统(540),其第二减少EUV光的发散以将光会聚到EUV掩模中; COPYRIGHT KIPO 2013; [参考数字](11)光源;检测部分(50)感测从EUV掩模的所有区域反射的EUV光的能量。

著录项

  • 公开/公告号KR20130044387A

    专利类型

  • 公开/公告日2013-05-03

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20110090205

  • 发明设计人 LEE DONG GUN;KIM SEONG SUE;

    申请日2011-09-06

  • 分类号G03F1/22;H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 16:27:14

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