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Apparatus and method for measuring an aerial image of EUV mask

机译:用于测量euv掩模的航空图像的设备和方法

摘要

Spatial image measuring device and the space on the image measurement start for EUV masks. Spatial image measuring apparatus according to one embodiment, the top has a reflective EUV (extreme ultra-violet) is located at the mask, the EUV reflective mask in the x-axis or y-axis direction moving unit for moving the upper parts of the mobile is located, the interference of the EUV light that reflects light of a certain wavelength by selecting X-ray mirror (mirror), located between the moving part and the X-ray mirror, the EUV light reflected by the interference of the EUV reflective mask Zone plate (zoneplate) lens for focusing on a portion, and positioned above the moving parts, if the focused EUV radiation is reflected by the interference portion of the reflective EUV mask, the interference detecting the reflected EUV light energy included a detector, wherein the zone plate lens, each of the numerical aperture of the detection and the exposure system (scanner) (numeric aperture) NA. zoneplate. , NA. detector. And NA. scanner. And entry wound of the exposure system Apostle (. ) Is, NA. zoneplate. = NA. scanner. / 4, and NA. detector. = NA. scanner. / 4 *. It satisfies the relationship. ; Area image, an aerial image, a defect, the exposure process.
机译:空间图像测量设备和图像测量空间开始用于EUV蒙版。根据一个实施例的空间图像测量设备,顶部具有反射EUV(极紫外)位于掩模处,该EUV反射掩模在x轴或y轴方向上移动单元,用于移动上部移动设备位于,通过选择位于移动部件和X射线镜之间的X射线镜(反射镜),EUV光的反射可反射特定波长的光,该EUV光被EUV反射光的干涉反射用于聚焦在一部分上并位于运动部件上方的波区板(zoneplate)透镜,如果聚焦的EUV辐射被反射EUV掩模的干涉部分反射,则检测反射的EUV光能的干涉包括检测器,其中区域平板透镜,检测的数值孔径和曝光系统(扫描仪)(数值孔径)NA中的每一个。 防区板。 ,不适用。 检测器。 和NA。 扫描仪。 和暴露系统的入口伤口使徒(。)是,NA。 防区板。 =不适用。 扫描仪。 / 4和NA。 检测器。 =不适用。 扫描仪。 / 4 *。满足关系。 ;区域图像,航空图像,缺陷,曝光过程。

著录项

  • 公开/公告号KR101535230B1

    专利类型

  • 公开/公告日2015-07-09

    原文格式PDF

  • 申请/专利权人 삼성전자주식회사;

    申请/专利号KR20090049097

  • 发明设计人 김성수;이동근;

    申请日2009-06-03

  • 分类号G01B9/02;G03F7/20;

  • 国家 KR

  • 入库时间 2022-08-21 14:57:58

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