DIBLOCK COPOLYMER BLEND COMPOSITION CAPABLE OF SELF-ASSEMBLING IN ORDER TO ALIGN ITSELF TO A SYMMETRY AXIS WHICH IS PERPENDICULAR TO A SURFACE OF A SUBSTRATE WHEN THE COMPOSITION IS APPLIED TO THE SUBSTRATE WITH THICKNESS WITHIN A RANGE OF REINFORCED FILM THICKNESS

摘要

PURPOSE: A diblock copolymer blend is provided to be vertically formed in line over a large range of film thickness, thereby providing improved process window about the change of film thickness deposited in a substrate.;CONSTITUTION: A diblock copolymer blend comprises: a regular poly(styrene)-b-poly(methyl methacrylate) diblock copolymer (BCP1) in which a volume fraction (Vf_BCP1-PS) of polystyrene of 50-99 wt% is 0.65-0.87; and an irregular poly(styrene)-b-poly(methyl methacrylate) diblock copolymer (BCP2) in which a volume fraction (Vf_BCP2-PS) of polystyrene of 1-50 wt% is 0.5-0.99. Here, a number average molecular weight (M_N-BCP1) of the BCP1 is 30-500 kg/mol. A number average molecular weight (M_N-BCP2) of the BCP2 is 0.1-500 kg/mol. The relation of M_N-BCP1M_N-BCP2 is satisfied.;COPYRIGHT KIPO 2013