WAFER TEXTURING DEVICE USING INDUCTIVE COUPLED PLASMA ANTENA

摘要

PURPOSE: A texturing device with a large diameter using ICP(inductively coupled plasma) antenna is provided to improve equipment efficiency by generating high density plasma with improved uniformity. CONSTITUTION: A chamber(110) receives one or more wafers(10) for a solar cell. A surface of the wafer is textured by plasma. A plurality of ceramic tubes(120) is formed in the chamber while leaving a certain interval. An ICP antenna is arranged inside the ceramic tubes The ICP antenna is formed into a coil shape having locally different pitches.