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Plasma doping apparatus having shadow mask and method of plasm doping using the same
Plasma doping apparatus having shadow mask and method of plasm doping using the same
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机译:具有荫罩的等离子体掺杂设备和使用该等离子体掺杂设备的等离子体掺杂方法
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摘要
PURPOSE: A plasma doping apparatus having a shadow mask and a plasma doping method using the same are provided to facilitate a doping process by forming a shadow mask in a vertical direction. CONSTITUTION: Plasma is formed in a chamber(110). A supporter(120) supports a doping object. The supporter is connected to power source(130). The power source is applied to the doping object. A shadow mask is mounted on the surface of the doping object.
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