PLASMA DOPING METHOD AND A PLASMA DOPING APPARATUS, CAPABLE OF IMPROVING THE ACCURACY WITH RESPECT TO A DOPED AMOUNT OF PLASMA

摘要

PURPOSE: A plasma doping method and a plasma doping apparatus are provided to stably perform a low-concentration doping operation by including a high frequency power unit which supplies high frequency power through a matching circuit.;CONSTITUTION: A vacuum container(1) includes a plasma generator(8). High frequency power is supplied to the plasma generator and generates plasma inside the vacuum container. The high frequency power is supplied to the sample electrode(6) in the vacuum container, and a low-concentration plasma doping process is performed with respect to a substrate on the sample electrode. The progressive wave and the reflected wave of the high frequency power is sample. If an integration value of the progressive wave and the reflected waves reaches to a pre-set value, the high frequency power is stop being supplied.;COPYRIGHT KIPO 2010