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DEVICE AND A METHOD FOR MEASURING A BACKLASH, CAPABLE OF MEASURING THE BACKLASH TO SUBARCSECOND OR SUBNANOMETER BY USING NEUTRON LIGHTS OR X-RAYS
DEVICE AND A METHOD FOR MEASURING A BACKLASH, CAPABLE OF MEASURING THE BACKLASH TO SUBARCSECOND OR SUBNANOMETER BY USING NEUTRON LIGHTS OR X-RAYS
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机译:用于测量背照的设备和方法,能够通过使用中子光或X射线来测量背照到亚秒或亚纳米级
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摘要
PURPOSE: A device and a method for measuring a backlash are provided to quantitatively measure the precision of the position control of a driving system affecting a product production in a precise control field in which a repetitive task is performed.;CONSTITUTION: A device for measuring a backlash includes a monochromator (20), an analyzing device (40), a control unit (60), and a detector (70). The monochromator performs the Bragg diffraction of incident lights. The lights diffracted by the monochromator are incident into the analyzing device, and the analyzing device performs the Bragg diffraction of the incident lights. The control unit controls a driving unit connected to the monochromator or the analyzing device, thereby rotting the monochromator or the analyzing device in a first direction and a second direction opposite to the first direction. The detector detects the lights diffracted by or penetrated through the analyzing device while the monochromator or the analyzing device are rotated and measures a backlash of the driving unit by using the detected lights.;COPYRIGHT KIPO 2013
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