首页> 外国专利> DEVICE AND A METHOD FOR MEASURING A BACKLASH, CAPABLE OF MEASURING THE BACKLASH TO SUBARCSECOND OR SUBNANOMETER BY USING NEUTRON LIGHTS OR X-RAYS

DEVICE AND A METHOD FOR MEASURING A BACKLASH, CAPABLE OF MEASURING THE BACKLASH TO SUBARCSECOND OR SUBNANOMETER BY USING NEUTRON LIGHTS OR X-RAYS

机译:用于测量背照的设备和方法,能够通过使用中子光或X射线来测量背照到亚秒或亚纳米级

摘要

PURPOSE: A device and a method for measuring a backlash are provided to quantitatively measure the precision of the position control of a driving system affecting a product production in a precise control field in which a repetitive task is performed.;CONSTITUTION: A device for measuring a backlash includes a monochromator (20), an analyzing device (40), a control unit (60), and a detector (70). The monochromator performs the Bragg diffraction of incident lights. The lights diffracted by the monochromator are incident into the analyzing device, and the analyzing device performs the Bragg diffraction of the incident lights. The control unit controls a driving unit connected to the monochromator or the analyzing device, thereby rotting the monochromator or the analyzing device in a first direction and a second direction opposite to the first direction. The detector detects the lights diffracted by or penetrated through the analyzing device while the monochromator or the analyzing device are rotated and measures a backlash of the driving unit by using the detected lights.;COPYRIGHT KIPO 2013
机译:目的:提供一种用于测量间隙的装置和方法,以在执行重复任务的精确控制领域中定量地测量影响产品生产的驱动系统的位置控制的精度。构成:用于测量的装置和方法齿隙包括单色仪(20),分析装置(40),控制单元(60)和检测器(70)。单色仪对入射光进行布拉格衍射。由单色仪衍射的光入射到分析装置中,并且分析装置对入射光进行布拉格衍射。控制单元控制连接到单色仪或分析装置的驱动单元,从而在第一方向和与第一方向相反的第二方向上使单色仪或分析装置腐烂。当单色仪或分析仪旋转时,检测器检测到被分析仪衍射或穿透的光,并使用检测到的光测量驱动单元的反冲。; COPYRIGHT KIPO 2013

著录项

  • 公开/公告号KR101312276B1

    专利类型

  • 公开/公告日2013-09-25

    原文格式PDF

  • 申请/专利权人 KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY;

    申请/专利号KR20120086164

  • 发明设计人 KIM MAN HO;

    申请日2012-08-07

  • 分类号G01N23/20;G01B15/00;

  • 国家 KR

  • 入库时间 2022-08-21 16:24:27

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